Detailansicht
Nanoscale Calibration Standards and Methods
Dimensional and Related Measurements in the Micro- and Nanometer Range
ISBN/EAN: 9783527405022
Umbreit-Nr.: 1416047
Sprache:
Englisch
Umfang: XXII, 519 S., 380 s/w Illustr., 380 Illustr.
Format in cm:
Einband:
gebundenes Buch
Erschienen am 09.05.2005
- Kurztext
- The quantitative determination of the properties of micro- and nanostructures is essential in research and development. Here, peer-reviewed papers are presented with contributions for the NanoScale 2004 seminar at the Physikalisch-Technische Bundesanstalt (PTB), Braunschweig, Germany, in March 2004. Topics include problems of quantitative measurement as well as methods of calibration, correction and instrumentation. The seminar stimulates the exchange of information between users in science and industry and manufacturers of the relevant hard- and software.
- Autorenportrait
- Günter Wilkening, Prof. Dr., Physikalisch-Technische Bundesanstalt, Braunschweig, Director of the Department of Nano- and Micrometrology Günter Wilkening received his Ph.D. in Solid State Physics from the Technical University of Braunschweig, Germany, in 1977. In 1978, he joined the National Metrology Institute (Physikalisch-Technische Bundesanstalt PTB), where he conducts research in the fields of force measurement and dimensional measurements in the micro- and nanometre range. Since 1988 he has been involved in Scanning Probe Microscopy and its use for quantitative measurements. In 1994, Professor Wilkening became head of the Nano- and Micrometrology Department. He is an active member of a number of national and international committees. Ludger Koenders, Dr. PhysikalischTechnische Bundesanstalt, Braunschweig, Layer Thickness and Nanostructures Department Ludger Koenders is head of the Film Thickness and Nanostructures Research Group at the National Metrology Institute (Technische Bundesanstalt PTB) in Braunschweig, Germany. He received his Diploma and his Ph.D. in Physics from the University of Duisburg. For his Ph.D. thesis he investigated the adsorption of hydrogen and oxygen on III-V semiconductor surfaces using surface analytical techniques (AES, EELS, UPS, XPS) and resonant Raman spectroscopy. He joined the National Metrology Institute in 1989 and has worked on investigations of tip-sample effects in STM, on the development metrological SPM and of transfer standards for SPM. He has co-ordinated several international comparisons in the field of step height and surface roughness measurements.